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Contact Line Instabilities
The newest industrial technologies in producing most accurate imaging at micro and nano scales, such as nano-lithography and micro inkjet printing, have opened up a plethora of unsolved issues in further development of the machines to realize these technologies. Many of these issues find their origin directly in the contact line instabilities at the interface of liquid, gas and solid at micro and smaller scales. The physical mechanisms behind these instabilities are very diverse in nature and raise a number of fundamental challenges. The aim of the workshop was to provide a bridge between the industrial and academic worlds, connecting technological challenges to the latest experimental and theoretical findings on contact line instabilities. The workshop also links the FOM-Industrial Partnership Program on wetting dynamics to the international scientific community.
The workshop was attended by 71 people from 10 countries, and enjoyed a mixed audience of leading scientists, young researchers and representatives from industry (ASML, OCE, Philips, SKF). Among the keynote speakers were: Andreotti (Paris), Bocquet (Lyon), Eggers (Bristol), De Coninck (Mons-Hainault), Limat (Paris), Pomeau (Paris), Quere (Paris). The main industrial and fundamental challenges were outlined by lectures during the first days of the program. This was followed by thematic workshops on the following specific topics:
These sessions were very instrumental in generating open discussion and turned out a key part of the meeting. In addition, the program contained many talks by PhD students and postdocs.
Outcome of the workshop
Several latest scientific and industrially related subjects were presented and intensively discussed. Some of the noteworthy findings are summed below:
Many of the above-mentioned discussions showed that still critical issues exist in film pulling, pinning, marangoni effects, teapot effects, splashing and coalescence that are apt for a new workshop later with more industrial applications. The goal of providing a bridge between industrial and academic world on the subject of contact line instabilities was well achieved during this workshop.
We thank the Lorentz Center for their excellent support both from organizational as well as financial aspects.
Detlef Lohse (University of Twente, The Netherlands)
Jacco Snoeijer (University of Twente, The Netherlands)
Ramin Badie (ASML Netherlands BV, The Netherlands)
Michel Riepen (ASML Netherlands BV, The Netherlands
Hans Reinten (Oce Technologies BV, The Netheralnds)
Herman Wijshoff (Oce Technologies BV, The Netherlands)